Schedule

Technical Program

The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) (Download PDF Flyer) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.

As in past conferences, the meeting will be preceded (Saturday, July 15) by one day of tutorials (1:00 p.m.-6:00 p.m) and a welcome reception (6:00 p.m.-8:00 p.m.). Sessions will take place (Sunday-Tuesday, July 16-18) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

Awards: Both ALD 2017 and ALE 2017 will recognize student achievement with awards for the best student posters and/or talks. See Awards Page

Mobile App: TheALD/ALE 2017 Mobile App is now available for download for iOS (iPhone/iPad) and Android. See Mobile App Page

ALD & ALE 2017 Tutorial Speakers and Schedule

Saturday, July 15, 2017, 1:00 p.m.-6:00 p.m.

• 1:00-1:05 – Tutorial Welcome
• 1:05-1:50 – David Emslie (McMaster Univ.), “ALD Precursors, Precursor Design, Chemistry and Mechanisms” (PDF)
• 1:50-2:35 – Adrie Mackus (Eindhoven Univ. of Technology), “Approaches, Challenges, and Opportunities for Area-selective ALD” (PDF)
• 2:35-3:20 – Mato Knez (Nanogune), “Coating of Physically and Chemically Challenging Substrates” (PDF)
• 3:20-3:40 – Break
• 3:40-4:25 – Simon Elliott (Tyndall National Institute), “What Theory Can Tell us About ALD Mechanism” (PDF)
• 4:25-5:10 – Vincent Donnelly (University of Houston), “Basic Mechanisms in Plasma Etching” (PDF)
• 5:10-5:55 – Geun Young Yeom (Sungkyunkwan Univ.), “Atomic Layer Etching with Ion/Neutral Beams” (PDF)

ALD & ALE 2017 Plenary Speakers and Schedule

Sunday, July 16, 2017, 8:15 a.m.-12:00 p.m.

• 8:15-8:30 – ALD Opening Remarks
• 8:30-9:15 – Suvi Haukka (ASM Microchemistry Ltd.), “Future Applications and Challenges for ALD in Microelectronics”
• 9:15-10:00 – Mei Chang (Applied Materials), “Future trends of Deposition Technology in Semiconductor Industry”
• 10:00-10:15 – Break
• 10:15-10:30 – ALE Opening Remarks
• 10:45-11:30 – Rick Gottscho (Lam Research), “Atomic Layer Etching – An Overview of Possibilities and Limitations”
• 11:30-11:45 – ALD Innovation Award Presentation
• 11:45-12:00 – Sponsor Preview
• 12:00-1:30 – Lunch and Exhibits

ALD 2017 Invited Speakers

• Adriana Creatore (Eindhoven Univ. of Technology)
• Carolyn Ellinger (Kodak Research Labs, Eastman Kodak Company)
• Dennis Hausmann (Lam Research)
• Maarit Karppinen (Aalto Univ.)
• Ville Mikkulainen (Helsinki Univ.)
• Ola Nilsen (Univ. of Oslo)
• Jin-Seong Park (Hanyang Univ., Korea)
• Joe Spencer (ALD NanoSolutions, USA)
• John Smythe (Micron)
• Andy (Xueliang) Sun (Univ. of Western Ontario)
• David Thompson (Applied Materials)
• Christophe Vallée (LETI-LTM)
• Angel Yanguas-Gil (Argonne National Lab)
• Sven Van Elshocht (IMEC)

ALE 2017 Invited Speakers

• Stacey Bent (Stanford Univ.)
• Yves Chabal (Univ. of Texas, Dallas)
• Jane Chang (UCLA)
• Robert Clark (Tel)
• Jesus del Alamo (MIT)
• Masanobu Honda (Tel)
• Mark Kushner (Univ. Michigan)
• Younghee Lee (Univ. Colorado)
• Nathan Marchack (IBM)
• Sumeet Pandey (Micron)
• Chuck Winter (Wayne State Univ.)
• Ying Zhang (AMAT)